Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor

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Title
Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
Authors
Keywords
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Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume 34, Issue 1, Pages 01A136
Publisher
American Vacuum Society
Online
2015-12-16
DOI
10.1116/1.4937734

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