Model polymer etching and surface modification by a time modulated RF plasma jet: role of atomic oxygen and water vapor

Title
Model polymer etching and surface modification by a time modulated RF plasma jet: role of atomic oxygen and water vapor
Authors
Keywords
-
Journal
JOURNAL OF PHYSICS D-APPLIED PHYSICS
Volume 50, Issue 3, Pages 03LT02
Publisher
IOP Publishing
Online
2016-12-13
DOI
10.1088/1361-6463/aa4e97

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