Quaternary composite of CdS/g-C3N4/rGO/CMC as a susceptible visible-light photocatalyst for effective abatement of ciprofloxacin: Optimization and modeling of the process by RSM and ANN
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Title
Quaternary composite of CdS/g-C3N4/rGO/CMC as a susceptible visible-light photocatalyst for effective abatement of ciprofloxacin: Optimization and modeling of the process by RSM and ANN
Authors
Keywords
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Journal
PROCESS SAFETY AND ENVIRONMENTAL PROTECTION
Volume 169, Issue -, Pages 352-362
Publisher
Elsevier BV
Online
2022-11-15
DOI
10.1016/j.psep.2022.11.030
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