Thermal Decomposition of Copper Iminopyrrolidinate Atomic Layer Deposition (ALD) Precursors on Silicon Oxide Surfaces

Published 2016 View Full Article

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Title
Thermal Decomposition of Copper Iminopyrrolidinate Atomic Layer Deposition (ALD) Precursors on Silicon Oxide Surfaces
Authors
Keywords
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Journal
Journal of Physical Chemistry C
Volume 120, Issue 26, Pages 14149-14156
Publisher
American Chemical Society (ACS)
Online
2016-06-24
DOI
10.1021/acs.jpcc.6b03818

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