Influence of annealing time on the physical properties of reactively sputtered CuO thin film
Published 2016 View Full Article
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Title
Influence of annealing time on the physical properties of reactively sputtered CuO thin film
Authors
Keywords
Annealing Time, Copper Oxide, Cupric Oxide, Thin Film Sample, Strong Diffraction Peak
Journal
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
Volume 28, Issue 6, Pages 4758-4762
Publisher
Springer Nature
Online
2016-11-24
DOI
10.1007/s10854-016-6120-y
References
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