P-type ZnO films deposited by DC reactive magnetron sputtering using codoping process
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Title
P-type ZnO films deposited by DC reactive magnetron sputtering using codoping process
Authors
Keywords
Nitrogen Flow, Hall Effect Measurement, Post Annealing Process, Corning Glass Substrate, Nitrogen Flow Increase
Journal
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
Volume 28, Issue 3, Pages 2852-2858
Publisher
Springer Nature
Online
2016-10-13
DOI
10.1007/s10854-016-5869-3
References
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