Effects of PECVD preparation conditions and microstructures of boron-doped polysilicon films on surface passivation of p-type tunnel oxide passivated contacts
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Title
Effects of PECVD preparation conditions and microstructures of boron-doped polysilicon films on surface passivation of p-type tunnel oxide passivated contacts
Authors
Keywords
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Journal
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
Volume 150, Issue -, Pages 106966
Publisher
Elsevier BV
Online
2022-07-21
DOI
10.1016/j.mssp.2022.106966
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