Journal
MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS
Volume 281, Issue -, Pages -Publisher
ELSEVIER
DOI: 10.1016/j.mseb.2022.115716
Keywords
-Ga 2 O 3; Swift heavy ion (SHI) irradiation; In situ I-V and C-V characteristics; Charge-trapping; Tunneling
Funding
- SERB under DST, GoI [PDF/2016/000748]
- Department of Science and Technology (DST) , India [3/GaO-Nitrides/2019]
- IIT Delhi, India
- IUAC Pelletron group, New Delhi
- IIT Delhi
- UGC-DAE CSR, Indore and Mangalore University for active collaboration
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This study investigated the electrical characteristics of Ni/HfO2/beta-Ga2O3 devices under swift heavy ion irradiation, revealing significant Poole-Frenkel emission at specific fluences. The barrier height and trap energy levels were found to be influenced by irradiation, with an increase in O defects within HfO2 due to electronic excitation.
In situ current-voltage and capacitance-voltage characteristics were performed on Ni/HfO2/beta-Ga2O3 devices using 120 MeV Ag7+ swift heavy ion (SHI) irradiation. The Poole-Frenkel emission is significant within 2.25-7.50 MV/cm until 5 x 1012 ions/cm2 and covers a full range of 0.01-7.50 MV/cm for the fluences of 1 x 1013 and 5 x 1013 ions/cm2 under gate injection. The estimated trap energy level is Ec - 0.73 eV for pristine device whereas Ec - 0.65 eV is for 5 x 1013 ions/cm2. Ni/HfO2 BH is 0.88 eV for the pristine device from Schottky emission. It is found to improve to 1.04 eV until 5 x 1012 ions/cm2 and then decrease to 0.75 eV at 5 x 1013 ions/cm2 due to the athermal annealing. From Fowler-Nordheim tunneling, the BH of Ni/HfO2 interface is 0.78 eV and 0.69 eV at 1 x 1013 ions/cm2 and 5 x 1013 ions/cm2. X-ray photoelectron spectroscopy at O 1s reveals an increase in O defects within HfO2 due to electronic excitation.
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