Aggregation Control, Surface Passivation, and Optimization of Device Structure toward Near-Infrared Perovskite Quantum-Dot Light-Emitting Diodes with an EQE up to 15.4%

In recent years, the performance of perovskite quantum dots (QDs) and QD-based light-emitting diodes (QLEDs) has improved greatly, with electroluminescence (EL) efficiency of green and red emission exceeding 20%. However, the development of perovskite near-infrared (NIR) QLEDs has reached stagnation, where the reported maximum EL efficiency is still below 6%, limiting their further applications. In this work, new NIR-emissive FAPbI(3) QDs are developed by post-treating long alkyl-encapsulated QDs with 2-phenylethylammonium iodide (PEAI). The incorporation of PEAI reduces the QD surface defects for giving a high photoluminescence quantum yield up to 61.6%. The n-octane solution of PEAI-passivated FAPbI(3) QDs is spin coated on top of the PEDOT:PSS-treated ITO electrode modified with a thermally crosslinked hole-transporting layer to give a full-coverage, smooth, and dense QD film. Incorporating with an effective electron-transporting material, CN-T2T, which has deep lowest unoccupied molecular orbital and good electron mobility, the optimal device with EL lambda(max) at 772 nm achieves an external quantum efficiency up to 15.4% at a current density of 0.54 mA cm(-2) (2.6 V), which is the highest efficiency ever reported for perovskite-based NIR QLEDs. This study provides a facile strategy to prepare high-quality perovskite QD films suitable for highly efficient NIR QLED applications.

Automated summary

In recent years, the performance and efficiency of perovskite quantum dots and QD-based light-emitting diodes have greatly improved, but the development of near-infrared QLEDs lags behind. In this study, new near-infrared-emissive perovskite quantum dots were developed through post-treatment, achieving high photoluminescence quantum yield and preparing high-quality films suitable for highly efficient near-infrared QLED applications.