4.6 Article

Study of DC Magnetron Sputtered Nb Films

Journal

CRYSTALS
Volume 12, Issue 1, Pages -

Publisher

MDPI
DOI: 10.3390/cryst12010031

Keywords

superconducting films; DC magnetron sputtering; Ar pressure; stress

Funding

  1. National Key Research and Development Program of China [2018YFB2003401]
  2. National Natural Science Foundation of China [61971471]
  3. Strategic Priority Research Program of Chinese Academy of Sciences [XDC07010100]

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In this study, a comprehensive analysis was conducted on the properties of DC magnetron sputtered Nb films fabricated with constant power at the National Institute of Metrology (China). The results showed that the stress and other parameters of the films can maintain a relatively stable state under constant power and Ar pressure.
As Nb films are widely used as superconducting electrodes of Josephson junctions, it is important to investigate the properties of Nb films in order to fabricate high-quality Josephson junctions. In this work, we conducted a comprehensive analysis of the relationships among the properties of DC magnetron sputtered Nb films with a constant power fabricated at the National Institute of Metrology (China). The film properties, including superconductivity, stress, lattice constant, and surface roughness, were investigated. It was found that in the case of constant power and Ar pressure, the stress and other parameters of the Nb films can maintain a relatively stable state during the continuous consumption of the target material.

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