Deposition of Very-Low-Hydrogen-Containing Silicon at a Low Temperature Using Very-High-Frequency (162 MHz) SiH4 Plasma
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Title
Deposition of Very-Low-Hydrogen-Containing Silicon at a Low Temperature Using Very-High-Frequency (162 MHz) SiH4 Plasma
Authors
Keywords
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Journal
Micromachines
Volume 13, Issue 2, Pages 173
Publisher
MDPI AG
Online
2022-01-26
DOI
10.3390/mi13020173
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Related references
Note: Only part of the references are listed.- Investigation of plasma uniformity, rotational and vibrational temperature in a 162 MHz multi-electrode capacitive discharge
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- Silicon Nitride Deposition for Flexible Organic Electronic Devices by VHF (162 MHz)-PECVD Using a Multi-Tile Push-Pull Plasma Source
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- Characteristics of silicon nitride deposited by VHF (162 MHz)-plasma enhanced chemical vapor deposition using a multi-tile push–pull plasma source
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- Scanning multishot irradiations on a large-area glass substrate for Xe-Arc flash lamp crystallization of amorphous silicon thin-film
- (2015) Jin-Ha Hwang et al. INTERNATIONAL JOURNAL OF THERMAL SCIENCES
- Measurement of nc-Si:H film uniformity and diagnosis of plasma spatial structure produced by a very high frequency, differentially powered, multi-tile plasma source
- (2015) E. Monaghan et al. VACUUM
- Structural and optical properties of nc-Si:H thin films deposited by layer-by-layer technique
- (2013) Boon Tong Goh et al. JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
- Low-temperature deposition of µc-Si : H thin films by a low-frequency inductively coupled plasma for photovoltaic applications
- (2013) D Y Wei et al. JOURNAL OF PHYSICS D-APPLIED PHYSICS
- Effect of an Oxide Cap Layer and Fluorine Implantation on the Metal-Induced Lateral Crystallization of Amorphous Silicon
- (2012) Kai Sun et al. ECS Journal of Solid State Science and Technology
- On the study of p-channel thin-film transistors fabricated by SLS ELA crystallization techniques
- (2009) M.A. Exarchos et al. THIN SOLID FILMS
- Low temperature fast growth of nanocrystalline silicon films by rf-PECVD from SiH4/H2gases: microstructural characterization
- (2008) Cheng-Zhao Chen et al. JOURNAL OF PHYSICS D-APPLIED PHYSICS
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