Uniform growth of MoS2 films using ultra-low MoO3 precursor in one-step heating chemical vapor deposition
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Title
Uniform growth of MoS2 films using ultra-low MoO3 precursor in one-step heating chemical vapor deposition
Authors
Keywords
Molybdenum disulfide, Molybdenum trioxide, Mo vapor concentration, Uniform thickness, One-step heating, Chemical vapor deposition
Journal
THIN SOLID FILMS
Volume 744, Issue -, Pages 139092
Publisher
Elsevier BV
Online
2022-01-10
DOI
10.1016/j.tsf.2022.139092
References
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