Recurrent Neural-Network-Based Model Predictive Control of a Plasma Etch Process

Multiscale Modeling and Recurrent Neural Network Based Optimization of a Plasma Etch Process

(2021) Tianqi Xiao et al.   Processes

Machine learning-based model predictive control of diffusion-reaction processes

(2021) Aarsh Dodhia et al.   CHEMICAL ENGINEERING RESEARCH & DESIGN

Integrating Dynamic Neural Network Models with Principal Component Analysis for Adaptive Model Predictive Control

(2020) Hesam Hassanpour et al.   CHEMICAL ENGINEERING RESEARCH & DESIGN

Multiscale modeling and neural network model based control of a plasma etch process

(2020) Tianqi Xiao et al.   CHEMICAL ENGINEERING RESEARCH & DESIGN

Multiscale modeling and control of pulp digester under fiber-to-fiber heterogeneity

(2020) Sang Hwan Son et al.   COMPUTERS & CHEMICAL ENGINEERING

Linearly Recurrent Autoencoder Networks for Learning Dynamics

(2019) Samuel E. Otto et al.   SIAM JOURNAL ON APPLIED DYNAMICAL SYSTEMS

Machine‐learning‐based predictive control of nonlinear processes. Part II: Computational implementation

(2019) Zhe Wu et al.   AICHE JOURNAL

Subspace identification for data-driven modeling and quality control of batch processes

(2016) Brandon Corbett et al.   AICHE JOURNAL

Synthesis of recurrent neural networks for dynamical system simulation

(2016) Adam P. Trischler et al.   NEURAL NETWORKS

Recurrent neural network for solving model predictive control problem in application of four-tank benchmark

(2016) Jing Xu et al.   NEUROCOMPUTING

Economic model predictive control of parabolic PDE systems: Addressing state estimation and computational efficiency

(2014) Liangfeng Lao et al.   JOURNAL OF PROCESS CONTROL

Plasma etching: Yesterday, today, and tomorrow

(2013) Vincent M. Donnelly et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Global Model of $\hbox{Cl}_{2}\hbox{/Ar}$ High-Density Plasma Discharge and 2-D Monte-Carlo Etching Model of InP

(2012) R. Chanson et al.   IEEE TRANSACTIONS ON PLASMA SCIENCE

A numerical method for the efficient atomistic simulation of the plasma-etch of nano-patterned structures

(2011) L. Chiaramonte et al.   COMPUTATIONAL MATERIALS SCIENCE

High aspect ratio silicon etch: A review

(2010) Banqiu Wu et al.   JOURNAL OF APPLIED PHYSICS

Investigation of etching and deposition processes of Cl2/O2/Ar inductively coupled plasmas on silicon by means of plasma–surface simulations and experiments

(2009) S Tinck et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Review of profile and roughening simulation in microelectronics plasma etching

(2009) Wei Guo et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Plasma atomic layer etching using conventional plasma equipment

(2009) Ankur Agarwal et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Reduced order modeling and dynamic optimization of multiscale PDE/kMC process systems

(2008) Amit Varshney et al.   COMPUTERS & CHEMICAL ENGINEERING

Distributed MPC Strategies With Application to Power System Automatic Generation Control

(2008) A.N. Venkat et al.   IEEE TRANSACTIONS ON CONTROL SYSTEMS TECHNOLOGY

Atomistic methods for the simulation of evolving surfaces

(2008) M A Gosálvez et al.   JOURNAL OF MICROMECHANICS AND MICROENGINEERING