Ferroelectricity of Hf $_{0.5}$ Zr $_{0.5}$ O₂ Thin Films Free From the Influence of Electrodes by Using Al₂O₃ Capping Layers

Authors

Keywords

Journal

Volume -, Issue -, Pages 1-6

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Online

2022-02-22

DOI

10.1109/ted.2022.3146098

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