Performance Improvement of Atomic Layer-Deposited ZnO/Al2O3Thin-Film Transistors by Low-Temperature Annealing in Air

Published 2016 View Full Article

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Title
Performance Improvement of Atomic Layer-Deposited ZnO/Al2O3Thin-Film Transistors by Low-Temperature Annealing in Air
Authors
Keywords
-
Journal
IEEE TRANSACTIONS ON ELECTRON DEVICES
Volume 63, Issue 5, Pages 1893-1898
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Online
2016-04-02
DOI
10.1109/ted.2016.2540679

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