4.6 Article

W-Band MMIC PA With Ultrahigh Power Density in 100-nm AlGaN/GaN Technology

Journal

IEEE TRANSACTIONS ON ELECTRON DEVICES
Volume 63, Issue 10, Pages 3882-3886

Publisher

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TED.2016.2597244

Keywords

Electron-beam lithography; GaN HEMT; power amplifier (PA); W-band

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A three-stage W-band GaN monolithic microwave integrated circuit power amplifier (MMIC PA) is reported. Electron-beam lithography has been employed to define a 100-nm T-shaped gate on the AlGaN/GaN HEMT structure with ultra-high aluminum content. The MMIC PA offers a peak small signal gain of 16.7 dB in the 90-97 GHz bandwidth. Moreover, it achieves a peak 1.66-W (32.2 dBm) output power at 93 GHz in a continuous-wave mode, with an associated power added efficiency of 21% and an associated power gain of 13.7 dB. Most notably, the peak power density is 3.46 W/mm with a 480-mu m wide output stage, which exceeds 3 W/mm in AlGaN/GaN HEMT at W-band for the first time.

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