4.8 Article

Analog Synaptic Transistor with Al-Doped HfO2 Ferroelectric Thin Film

Journal

ACS APPLIED MATERIALS & INTERFACES
Volume 13, Issue 44, Pages 52743-52753

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/acsami.1c12735

Keywords

Al-doped HfO2; multilevel polarization; ferroelectric thin-film transistor; analog synaptic device; neuromorphic computing

Funding

  1. Hyundai Motor Company
  2. Future Semiconductor Device Technology Development Program - MOTIE (Ministry of Trade, Industry Energy) [10080689, 20003808, 20004399]
  3. KSRC (Korea Semiconductor Research Consortium)
  4. BK21 program
  5. Korea Evaluation Institute of Industrial Technology (KEIT) [10080689, 20003808] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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Neuromorphic computing has attracted attention for overcoming the limitations of von-Neumann computing, with analog synaptic devices playing a crucial role in hardware-based artificial neuromorphic devices. This study demonstrates the synaptic characteristics of a ferroelectric material-based thin-film transistor, showing successful emulation of short-term and long-term plasticity. The research suggests that ferroelectric transistors can serve as alternative artificial synapses with high linearity and pattern recognition accuracy.
Neuromorphic computing has garnered significant attention because it can overcome the limitations of the current von-Neumann computing system. Analog synaptic devices are essential for realizing hardware-based artificial neuromorphic devices; however, only a few systematic studies in terms of both synaptic materials and device structures have been conducted so far, and thus, further research is required in this direction. In this study, we demonstrate the synaptic characteristics of a ferroelectric material-based thin-film transistor (FeTFT) that uses partial switching of ferroelectric polarization to implement analog conductance modulation. For a ferroelectric material, an aluminum-doped hafnium oxide (Al-doped HfO2) thin film was prepared by atomic layer deposition. As an analog synaptic device, our FeTFT successfully emulated short-term plasticity and long-term plasticity characteristics, such as paired-pulse facilitation and spike timing-dependent plasticity. In addition, we obtained potentiation/depression weight updates with high linearity, an on/off ratio, and low cycle-to-cycle variation by adjusting the amplitude and number of input pulses. In the simulation trained with optimized potentiation/depression conditions, we achieved a pattern recognition accuracy of approximately 90% for the Modified National Institute of Standard and Technology (MNIST) handwritten data set. Our results indicated that ferroelectric transistors can be used as an alternative artificial synapse.

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