Improved properties of atomic layer deposited ruthenium via postdeposition annealing

Title
Improved properties of atomic layer deposited ruthenium via postdeposition annealing
Authors
Keywords
-
Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume 39, Issue 5, Pages 052402
Publisher
American Vacuum Society
Online
2021-07-27
DOI
10.1116/6.0001078

Ask authors/readers for more resources

Find Funding. Review Successful Grants.

Explore over 25,000 new funding opportunities and over 6,000,000 successful grants.

Explore

Publish scientific posters with Peeref

Peeref publishes scientific posters from all research disciplines. Our Diamond Open Access policy means free access to content and no publication fees for authors.

Learn More