4.6 Article Proceedings Paper

Ferroelectric-on-Si Super-High-Frequency Fin Bulk Acoustic Resonators With Hf0.5Zr0.5O2 Nanolaminated Transducers

Journal

IEEE MICROWAVE AND WIRELESS COMPONENTS LETTERS
Volume 31, Issue 6, Pages 701-704

Publisher

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LMWC.2021.3067509

Keywords

Ferroelectric transducer; fin bulk acoustic resonator (FinBAR); Hf0.5Zr0.5O2; nanolaminate; super-high-frequency

Funding

  1. DARPA Young Faculty Award Program [D19AP00044]

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This paper presents ferroelectric-on-semiconductor fin bulk acoustic resonators (FoS-FinBARs) with lithographically scaled frequencies up to 18 GHz and high k(eff)(2).Q of up to 17, utilizing ferroelectric hafnium zirconium oxide nanolaminates and conformally deposited transducers on silicon fins. The FoS-FinBARs, created by a CMOS-compatible process, demonstrate frequencies ranging from 2-18 GHz, Qs exceeding 500, and k(eff)(2)s as high as 4.7%.
This letter reports, for the first time, on the ferroelectric-on-semiconductor fin bulk acoustic resonators (FoS-FinBARs) with lithographically scaled frequencies up to 18 GHz and k(eff)(2).Q as high as 17. The FoS-FinBARs benefit from the large electromechanical coupling of the ferroelectric hafnium zirconium oxide (Hf0.5Zr0.5O2) nanolaminates created by atomic layering. The ferroelectric transducer is conformally deposited on silicon fins with sub-1-mu m widths enabling excitation of super-high-frequency bulk acoustic wave resonance modes with increasing k(eff)(2) at higher frequencies. FoS-FinBARs, created by a CMOS-compatible process, are presented with frequencies over 2-18 GHz, Qs exceeding 500, and k(eff)(2)s as high as 4.7%.

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