4.8 Article

Low Power MoS2/Nb2O5 Memtransistor Device with Highly Reliable Heterosynaptic Plasticity

Journal

ADVANCED FUNCTIONAL MATERIALS
Volume 31, Issue 40, Pages -

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/adfm.202104174

Keywords

heterosynaptic plasticity; memtransistors; MNIST pattern recognition; MoS; (2); Nb; O-2; (5) heterostructures; neuromorphic systems

Funding

  1. National Research Foundation of Korea (NRF) - Korean Government (MSIT, Ministry of Science and ICT) [2020R1A2C4001739]
  2. Korea Institute of Materials Science (KIMS) [PNK7660]
  3. National Research Council of Science & Technology (NST), Republic of Korea [PNK7660] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
  4. National Research Foundation of Korea [2020R1A2C4001739] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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A highly reliable 2D MoS2/Nb2O5 heterostructure memtransistor device is demonstrated, with the Nb2O5 interlayer thickness being a critical material parameter for analog switching characteristics. The increased Schottky barrier height at the channel-electrode junction leads to more effective contact barrier modulation and more reliable resistive switching. The memtransistor devices achieve dual-terminal stimulated heterosynaptic plasticity and high accurate multi-states.
Artificial synapses based on 2D MoS2 memtransistors have recently attracted considerable attention as a promising device architecture for complex neuromorphic systems. However, previous memtransistor devices occasionally cause uncontrollable analog switching and unreliable synaptic plasticity due to random variations in the field-induced defect migration. Herein, a highly reliable 2D MoS2/Nb2O5 heterostructure memtransistor device is demonstrated, in which the Nb2O5 interlayer thickness is a critical material parameter to induce and tune analog switching characteristics of the 2D MoS2. Ultraviolet photoelectron spectroscopy and photoluminescence analyses reveal that the Schottky barrier height at the 2D channel-electrode junction of the MoS2/Nb2O5 heterostructure films is increased, leading to more effective contact barrier modulation and allowing more reliable resistive switching. The 2D/oxide memtransistors attain dual-terminal (drain and gate) stimulated heterosynaptic plasticity and highly precise multi-states. In addition, the memtransistor devices show an extremely low power consumption of approximate to 6 pJ and reliable potentiation/depression endurance characteristics over 2000 pulses. A high pattern recognition accuracy of approximate to 94.2% is finally achieved from the synaptic plasticity modulated by the drain pulse configuration using an image pattern recognition simulation. Thus, the novel 2D/oxide memtransistor makes a potential neuromorphic circuitry more flexible and energy-efficient, promoting the development of more advanced neuromorphic systems.

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