Journal
FRONTIERS IN PHYSICS
Volume 9, Issue -, Pages -Publisher
FRONTIERS MEDIA SA
DOI: 10.3389/fphy.2021.631918
Keywords
physical vapor deposition; chemical vapor deposition; atomic layer deposition; electrochemical deposition; nanorods; graphene; transition metal dichalcogenide; Li metal anode
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Funding
- European Union (European Social Fund-ESF) through the Operational Program Human Resources Development, Education and Lifelong Learning [MIS-5033021]
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Monte Carlo and kinetic Monte Carlo models are widely used for studying physicochemical surface phenomena in deposition processes, offering a more detailed approach than popular molecular methods and addressing larger time and spatial scales. This review explores the modern applications of MC/kMC models in deposition processes.
Monte Carlo (MC) and kinetic Monte Carlo (kMC) models are widely used for studying the physicochemical surface phenomena encountered in most deposition processes. This spans from physical and chemical vapor deposition to atomic layer and electrochemical deposition. MC and kMC, in comparison to popular molecular methods, such as Molecular Mechanics/Dynamics, have the ability to address much larger time and spatial scales. They also offer a far more detailed approach of the surface processes than continuum-type models, such as the reaction-diffusion models. This work presents a review of the modern applications of MC/kMC models employed in deposition processes.
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