4.6 Article

Enhanced Dye Degradation through Multi-Particle Confinement in a Porous Silicon Substrate: A Highly Efficient, Low Band Gap Photocatalyst

Journal

ADVANCED OPTICAL MATERIALS
Volume 9, Issue 11, Pages -

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/adom.202002238

Keywords

block‐ copolymer self‐ assembly; confined space photocatalysis; finite difference time domain simulation; metamaterials; soft nanolithography

Funding

  1. European Union's Horizon 2020 research and innovation programme under the Marie Sklodowska-Curie grant [713567]
  2. European Union's Horizon 2020 research and innovation programme [760915]
  3. Enterprise Ireland
  4. Science Foundation Ireland (SFI) [12/RC/2278_P2]
  5. Higher Education Authority, through its PRTLI program
  6. H2020 Societal Challenges Programme [760915] Funding Source: H2020 Societal Challenges Programme

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A platform is introduced for creating a reusable and highly efficient low band gap photocatalyst by confining gold nanoparticles in nanopatterned Si monolith. This design prevents agglomeration of nanoparticles and enhances redox reaction efficiency while minimizing rapid recombination of photogenerated charge carriers. Compared to bare silicon and randomly dispersed AuNPs on silicon, the confined structure achieved near complete degradation of MO due to more active sites and effective Schottky junctions.
A platform is introduced for fabrication of a reusable and highly efficient low band gap photocatalyst by confining gold nanoparticles (AuNPs) in the pores of a nanopatterned Si monolith (AuNSM). Due to their size, a maximum of two AuNPs can assemble in a single pore, thus preventing agglomerations. Their access to the analyte provides more active sites for redox reaction, leading to enhanced efficiency. While proximity of nanoparticles enhances coupling efficiency, confinement prevents rapid recombination of photogenerated charge carriers, a major factor contributing to low efficiency of photocatalytic materials. Degradation of methyl orange (MO) is used to determine the photocatalytic efficacy of AuNSM compared to 1) bare silicon and 2) AuNPs randomly dispersed on silicon. After 90 min of exposure to UV light (lambda = 353 nm) in the AuNSM, the MO absorption is <1%, indicating near complete degradation, while it is still 85% and 70% for systems (1) and (2), respectively. Finite element method simulations of the confined structure suggest that the AuNPs act as a mediator/receptacle for photogenerated charges rather than a source of them at this wavelength and thus enhance the performance of the photocatalyst by creating more effective Schottky junctions-preventing recombination of electrons and holes-rather than by a localized surface plasmonic resonance effect.

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