Anti-reflection silicon with self-cleaning processed by femtosecond laser
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Title
Anti-reflection silicon with self-cleaning processed by femtosecond laser
Authors
Keywords
Anti-reflection, Self-cleaning, Femtosecond laser, Chemical modification, Photo-thermal conversion
Journal
OPTICS AND LASER TECHNOLOGY
Volume 136, Issue -, Pages 106790
Publisher
Elsevier BV
Online
2020-12-04
DOI
10.1016/j.optlastec.2020.106790
References
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