4.7 Article

Towards superior nickel oxide electrochromic films using Si and Li co-doping and rapid thermal annealing

Journal

JOURNAL OF ALLOYS AND COMPOUNDS
Volume 862, Issue -, Pages -

Publisher

ELSEVIER SCIENCE SA
DOI: 10.1016/j.jallcom.2021.158665

Keywords

Nickel oxide film; Electrochromic; Si and Li co-doping; Magnetron sputtering; Rapid thermal annealing

Funding

  1. Zhejiang Provincial Natural Science Foundation of China [LGG21F040001]
  2. K.C. Wong Magna Fund in Ningbo University

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A novel technical routine using Si and Li co-doping oxide target in Ar atmosphere and subsequent RTA treatment at 400 degrees C has been developed to improve the EC performance of nickel oxide counter-electrode films. The doped and annealed film shows superior properties with high bleached transmittance, large optical modulation, big charge capacity, excellent electrochemical stability, and rapid response times, making it promising for future high-quality EC devices.
Herein, we firstly report a novel technical routine to improve the electrochromic (EC) performance of frequently-used nickel oxide counter-electrode films by RF magnetron sputtering using a Si and Li co-doping oxide target in Ar atmosphere and subsequently rapid thermal annealing (RTA) at 400 degrees C in air. The effects of co-doping and RTA treatment on the phase structure, microstructure, chemical states of Ni element, and EC properties of films were comprehensively investigated using X-ray diffraction, scanning electron microscope, X-ray photoelectron spectroscopy and electrochemical analysis. Comparing with the undoped and the as-deposited films, it is found that the mutual effects of Si and Li co-doping and RTA treatment can promote a preferential growth in (111) direction of nickel oxide, enhance the relative atomic concentration of Ni3+ to 60% in the total Ni element, and help to form a smooth and compact structure with uniformly distributed fine pinholes. The doped and annealed film behaves with the highest bleached transmittance of 93.3% (at 550 nm), largest optical modulation of 37.0% (at 550 nm), biggest charge capacity of 14.8 mC.cm(-2), best electrochemical stability to bear more than 100 cycles, and rapid bleaching and coloring response times of 2.4 and 8.8 s. These superior performances make this kind of material promising for future application in high quality EC devices. (C) 2021 Elsevier B.V. All rights reserved.

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