4.7 Article

Nickel oxide films by chemical spray: Effect of deposition temperature and solvent type on structural, optical, and surface properties

Journal

APPLIED SURFACE SCIENCE
Volume 548, Issue -, Pages -

Publisher

ELSEVIER
DOI: 10.1016/j.apsusc.2021.149118

Keywords

NiO film; Spray pyrolysis; Surface chemical composition; Photocatalytic activity

Funding

  1. Estonian Research Council [PRG627]
  2. Estonian Centre of Excellence project [TAR16016EK, TK141]
  3. European Commission's H2020 programme under the ERA Chair project 5GSOLAR [952509]
  4. ASTRA TUT Institutional Development Programme for 2016-2022 Graduate School of Functional Materials and Technologies [2014-2020.4.01.16-0032]

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NiO films were grown using spray pyrolysis method, with deposition temperature and solvent type significantly affecting their properties. The hydroxyl group content on the surface was found to primarily influence the photocatalytic degradation efficiency. Lower deposition temperature resulted in higher efficiency in degrading methyl orange pollutants.
Nickel(II) oxide (NiO) films were grown via spray pyrolysis method. The effects of deposition temperature (Ts) and solvent type (aqueous, alcoholic) on the properties of the NiO films were studied. It was found that Ts significantly influenced the surface chemical composition, wettability, and photocatalytic activity (PA) toward degradation of methyl orange (MO) pollutant. The solvent type significantly affected the optical and structural properties of the NiO films. In accordance with the XRD and Raman studies, all deposited NiO films were nanocrystalline defective NiO. According to the XPS study, the OH-/Ni-O ratio decreased from 3.31 to 0.59 for the films grown from aqueous solutions at Ts = 300 and 420 degrees C, respectively, indicating that the surfaces of films grown at lower temperatures were richer in hydroxyl groups. Photocatalytic degradation efficiency was primarily affected by the hydroxyl group content on the surface. The NiO films grown at lower Ts (Ts = 300 degrees C) demonstrated 4-fold higher degradation efficiency toward MO degradation, at 45% over 3 h, relative to that of the films grown at Ts = 420 degrees C (11% over 3 h).

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