Contribution of 80 MeV silicon swift heavy ion irradiation for reforming of optical and structural properties of amorphous Ge23Se62As15 thin films for telecommunication and sensing applications
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Title
Contribution of 80 MeV silicon swift heavy ion irradiation for reforming of optical and structural properties of amorphous Ge23Se62As15 thin films for telecommunication and sensing applications
Authors
Keywords
Amorphous thin films, Thermal vapor evaporation, Swift heavy ion, Swanepoel method, Micro Raman analysis
Journal
JOURNAL OF NON-CRYSTALLINE SOLIDS
Volume 554, Issue -, Pages 120597
Publisher
Elsevier BV
Online
2021-01-02
DOI
10.1016/j.jnoncrysol.2020.120597
References
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