Silicon nitride deposited by laser assisted plasma enhanced chemical vapor deposition for next generation organic electronic devices

Influence of residual stress on performance of AlN thin film based piezoelectric MEMS accelerometer structure

(2019) Nidhi Gupta et al.   MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS

PECVD grown silicon nitride ultra-thin films for CNTFETs

(2019) P R Yasasvi Gangavarapu et al.   SEMICONDUCTOR SCIENCE AND TECHNOLOGY

Nitriding process for next-generation semiconductor devices by VHF (162 MHz) multi-tile push-pull plasma source

(2019) You Jin Ji et al.   APPLIED SURFACE SCIENCE

Characteristic Study of Silicon Nitride Films Deposited by LPCVD and PECVD

(2018) Chris Yang et al.   Silicon

Silicon Nitride Deposition for Flexible Organic Electronic Devices by VHF (162 MHz)-PECVD Using a Multi-Tile Push-Pull Plasma Source

(2017) Ki Seok Kim et al.   Scientific Reports

Characteristics of silicon nitride deposited by VHF (162 MHz)-plasma enhanced chemical vapor deposition using a multi-tile push–pull plasma source

(2016) Ki Seok Kim et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Efficient and mechanically robust stretchable organic light-emitting devices by a laser-programmable buckling process

(2016) Da Yin et al.   Nature Communications

Synthesis and characterization of arylamino end-capped silafluorenes for blue to deep-blue organic light-emitting diodes (OLEDs)

(2015) Shao Fu Chen et al.   Journal of Materials Chemistry C

Silicon Nitride Films Deposited by RF Sputtering for Microstructure Fabrication in MEMS

(2009) Vivekanand Bhatt et al.   JOURNAL OF ELECTRONIC MATERIALS

Failure analysis of a thin-film nitride MEMS package

(2008) Q. Li et al.   MICROELECTRONICS RELIABILITY