An ultra heat-resistant polyimide formulated with photo-base generator for alkaline-developable, negative-type photoresist
Published 2020 View Full Article
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Title
An ultra heat-resistant polyimide formulated with photo-base generator for alkaline-developable, negative-type photoresist
Authors
Keywords
Photosensitive polyimide, Negative-type photoresist, Photo-base generator, Alkaline-developable
Journal
REACTIVE & FUNCTIONAL POLYMERS
Volume 157, Issue -, Pages 104760
Publisher
Elsevier BV
Online
2020-10-17
DOI
10.1016/j.reactfunctpolym.2020.104760
References
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