4.5 Article

Changes in Resistance and Bandgap of V2O5 and Ge2Sb2Te5 during Phase Transition

Journal

JOURNAL OF ELECTRONIC MATERIALS
Volume 50, Issue 2, Pages 491-496

Publisher

SPRINGER
DOI: 10.1007/s11664-020-08599-5

Keywords

V2O5; bandgap; resistance; phase-change memory; phase-transition time

Funding

  1. National Natural Science Foundation of China [11974008, 11774438]
  2. Changzhou Key Laboratory of High Technology Research [CM20173002]
  3. open project of the Institute of Semiconductors, Chinese Academy of Sciences [klsm-1805]

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V2O5 and GST films were prepared by magnetron sputtering, and their transition from amorphous to crystalline states were studied in detail. V2O5 exhibited higher phase-transition temperatures and resistance compared to GST, and the phase-change memory device based on V2O5 showed lower operating power and shorter phase-transition time than that based on GST. The potential applications of V2O5 and GST for multilevel storage were also compared.
V2O5 and Ge2Sb2Te5 (GST) films have been prepared by magnetron sputtering, and their transformation from amorphous to crystalline state studied by in situ resistance temperature measurements. During the heating process, a two-step transition was observed for both films, revealing three resistances corresponding to amorphous, intermediate, and crystalline states. The two phase-transition temperatures were 371.1 degrees C and 394.0 degrees C for V2O5, much higher than the values of similar to 172.4 degrees C and 240.4 degrees C for GST. Compared with GST, the resistance of V2O5 was two orders of magnitude higher. The changes in the resistance and bandgap of V2O5 and GST during phase transition were investigated in detail. A phase-change memory device based on V2O5 was fabricated. Compared with GST, V2O5 exhibited a lower operating power and shorter phase-transition time. The application potential of V2O5 and GST for multilevel storage was compared.

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