4.6 Article

Wafer-scale graphene-ferroelectric HfO2/Ge-HfO2/HfO2 transistors acting as three-terminal memristors

Journal

NANOTECHNOLOGY
Volume 31, Issue 49, Pages -

Publisher

IOP Publishing Ltd
DOI: 10.1088/1361-6528/abb2bf

Keywords

memtransistor; HfO(2)ferroelectricity; graphene

Funding

  1. UEFISCDI [PN-III-P4-ID-PCCF-2016-0033]
  2. Romanian Ministry of Research and Innovation [21 N/08.02.2019, PN19-03]
  3. MICRO-NANO-SIS PLUS, 2019-2022a, UEFISCDI [PN-III-P4-ID-PCCF-2016-0033]

Ask authors/readers for more resources

In this paper we report a set of experiments at the wafer level regarding field-effect transistors with a graphene monolayer channel transferred on the ferroelectric HfO2/Ge-HfO2/HfO(2)three-layer structure. This kind of transistor has a switching ratio of 10(3)between on and off states due to the bandgap in graphene induced by the ferroelectric structure. Both top and back gates effectively control the carriers' charge flow in graphene. The transistor acts as a three-terminal memristor, termed a memtransistor, with applications in neuromorphic computation.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.6
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available