Synthesis of TiN and TiO2thin films by cathodic cage plasma deposition: a brief review

The cathodic cage plasma deposition (CCPD) is an advanced technique recently developed from an active screen plasma nitriding system, which has been used for thin film deposition such as titanium nitride and titanium dioxide (TiO2). These coatings can improve the physical, mechanical, and optical properties of numerous materials, and such coatings can be developed by several techniques. Unfortunately, the conventional deposition techniques exhibit certain drawbacks, including high cost, the complexity of the operation, very low pressure, and high processing temperature; as a result, CCPD is an advantageous technique. In this review, brief information on the deposition of titanium nitride and oxide coatings on steel alloys, titanium, glass, and silicon substrates, and the effect of control parameters on deposition efficiency is provided. The effectiveness of this system for the synthesis of thin films on various substrates, including insulators and conductors, is also summarized. The recent developments and applications of CCPD for titanium-based coatings are described in detail.