Removal of tetramethylammonium hydroxide (TMAH) in semiconductor wastewater using the nano-ozone/H2O2 process

Published 2020 View Full Article

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Title
Removal of tetramethylammonium hydroxide (TMAH) in semiconductor wastewater using the nano-ozone/H2O2 process
Authors
Keywords
Nano-ozone, H, 2, O, 2, TMAH, Toxicity, Semiconductor wastewater
Journal
JOURNAL OF HAZARDOUS MATERIALS
Volume -, Issue -, Pages 123759
Publisher
Elsevier BV
Online
2020-08-23
DOI
10.1016/j.jhazmat.2020.123759

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