4.8 Article

Kinetic Pathways of Block Copolymer Directed Self-Assembly: Insights from Efficient Continuum Modeling

Journal

ACS NANO
Volume 14, Issue 10, Pages 13986-13994

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/acsnano.0c06433

Keywords

block copolymers; directed self-assembly; kinetics; computer simulation; Onsager coefficients; metastable states; morphology

Funding

  1. Alexander-von-Humboldt foundation
  2. Deutsche Forschungsgemeinschaft [Mu 1674/15-2]
  3. Canada First Research Excellence Fund, Quantum Materials and Future Technologies Program

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We introduce a computationally efficient continuum technique to simulate the complex kinetic pathways of block copolymer self-assembly. Subdiffusive chain dynamics is taken into account via nonlocal Onsager coefficients. An application to directed self-assembly of thin films of diblock copolymers on patterned substrates reveals the conditions under which experimentally observed metastable structures intervene in the desired thin-film morphology. The approach generalizes easily to multiblock copolymers and more complex guiding patterns on the substrate, and its efficiency allows for the systematic optimization of guiding patterns and process conditions.

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