Predictive control of the plasma processes in the OLED display mass production referring to the discontinuity qualifying PI-VM

Cause analysis of the faults in HARC etching processes by using the PI-VM model for OLED display manufacturing

(2019) Seolhye Park et al.   Plasma Processes and Polymers

Application of PI-VM for Management of the Metal Target Plasma Etching Processes in OLED Display Manufacturing

(2018) Seolhye Park et al.   PLASMA PHYSICS AND CONTROLLED FUSION

Enhancement of the Virtual Metrology Performance for Plasma-Assisted Oxide Etching Processes by Using Plasma Information (PI) Parameters

(2015) Seolhye Park et al.   IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING

Characteristics of a non-Maxwellian electron energy distribution in a low-pressure argon plasma

(2014) Seolhye Park et al.   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Synthesis and characterization of Ni–Al2O3 composite coatings containing different forms of alumina

(2010) S. T. Aruna et al.   JOURNAL OF APPLIED ELECTROCHEMISTRY

Radical surface interactions in industrial silicon plasma etch reactors

(2010) G Cunge et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY