Journal
OPTICS EXPRESS
Volume 28, Issue 17, Pages 24452-24458Publisher
OPTICAL SOC AMER
DOI: 10.1364/OE.401959
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Funding
- National Science Foundation [NNCI-1542081, 1541959]
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Thin-film lithium niobate (LN) photonic integrated circuits (PICs) could enable ultrahigh performance in electro-optic and nonlinear optical devices. To date, realizations have been limited to chip-scale proof-of-concepts. Here we demonstrate monolithic LN PICs fabricated on 4- and 6-inch wafers with deep ultraviolet lithography and show smooth and uniform etching, achieving 0.27 dB/cm optical propagation loss on wafer-scale. Our results show that LN PICs are fundamentally scalable and can be highly cost-effective. (C) 2020 Optical Society of America under the terms of the OSA Open Access Publishing Agreement
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