Experimental determination of electron attenuation lengths in complex materials by means of epitaxial film growth: Advantages and challenges

Accurate electron attenuation lengths are of critical importance in using electron spectroscopic methods to quantitatively characterize complex materials. Here, the authors show that analysis of core-level and valence-band x-ray photoelectron spectra excited with monochromatic AlK alpha x-rays from the substrate and measured as a function of film thickness can be used to determine electron attenuation lengths in epitaxial SrTiO(3)films on Ge(001). Closely lattice-matched epitaxial heterojunctions are ideal systems for determining attenuation lengths provided the films grow in a layer-by-layer fashion, leading to atomically flat surfaces, and the buried interfaces are atomically abrupt. In principle, either the rate of attenuation of substrate peak intensities or the rate of increase of film peak intensities can be used for this purpose. However, the authors find that structural nonuniformities in the films reduce the accuracy of electron attenuation lengths determined from photoelectrons that originatewithinthe films. A more reliable source of information is found in photoelectrons from the substrate which traverse the film. By using the energy dependence of calculated electron attenuation lengths from the NIST database in combination with Ge 3d core and Ge-derived valence-band intensities, the authors determine electron attenuation length as a function of kinetic energy for SrTiO3.