Electroplated Ru and RuCo films as a copper diffusion barrier

Published 2020 View Full Article

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Title
Electroplated Ru and RuCo films as a copper diffusion barrier
Authors
Keywords
Textured silicon, Electroplating, Solar cells, Thermal stability
Journal
APPLIED SURFACE SCIENCE
Volume 516, Issue -, Pages 146139
Publisher
Elsevier BV
Online
2020-03-20
DOI
10.1016/j.apsusc.2020.146139

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