4.8 Article

Gallium Doping Effects for Improving Switching Performance of p-Type Copper(I) Oxide Thin-Film Transistors

Journal

ACS APPLIED MATERIALS & INTERFACES
Volume 12, Issue 34, Pages 38350-38356

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/acsami.0c09243

Keywords

gallium; copper oxide; cuprous oxide; thin-film transistors; oxide semiconductor; PMOS

Funding

  1. Nano . Material Technology Development Program through the National Research Foundation of Korea (NRF) - Ministry of Science and ICT [2018M3A7B4071521]
  2. LG Display
  3. National Research Foundation of Korea [2018M3A7B4071521] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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Copper(I) oxide (Cu2O), which is obtained from copper(II) oxide (CuO) through a reduction process, is a p-type oxide material with a band gap of 2.1-2.4 eV. However, the switching performance of typical Cu2O thin-film transistors (TFTs) is poor because the reduction process increases the concentration of oxygen vacancies (V-o), which interfere with the conduction of hole carriers. Ga with high oxygen affinity was doped in Cu2O thin films to decrease V-o during the reduction process. As a result, the V-o concentration of 1.56 at % for Ga-doped Cu2O (Ga:Cu2O) thin films decreased from 20.2 to 7.5% compared to pristine Cu2O thin films. Accordingly, the subthreshold swing or S-factor, on/off-current ratio (I-on/off), saturation mobility (mu(sat)), and threshold voltage (V-th) of Ga:Cu2O TFTs were improved compared to pristine Cu2O TFTs with values of 7.72 from 12.50 V/dec, 1.22 x 10(4) from 2.74 x 10(2), 0.74 from 0.46 cm(2)/Vs, and -4.56 from -8.06 V, respectively. These results indicate that Ga plays an important role in improving the switching performance of p-type Cu2O TFT.

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