4.6 Article

Enhancing the lateral current injection by modulating the doping type in the p-type hole injection layer for InGaN/GaN vertical cavity surface emitting lasers

Journal

OPTICS EXPRESS
Volume 28, Issue 12, Pages 18035-18048

Publisher

OPTICAL SOC AMER
DOI: 10.1364/OE.396482

Keywords

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Funding

  1. National Natural Science Foundation of China [61975051]
  2. Program for Top 100 Innovative Talents in Colleges and Universities of Hebei Province [SLRC2017032]
  3. Program for 100-Talent-Plan of Hebei Province [E2016100010]
  4. Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO) Research Fund of Chinese Academy of Sciences [19ZS02]
  5. Hebei University of Technology [HI1909]
  6. Graduate Innovation Foundation of Hebei Province [CXZZBS2020027]
  7. Tunghsu Group [HI1909]

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In this report, we propose GaN-based vertical cavity surface emitting lasers with a p-GaN/n-GaN/p-GaN (PNP-GaN) structured current spreading layer. The PNP-GaN current spreading layer can generate the energy band barrier in the valence band because of the modulated doping type, which is able to favor the current spreading into the aperture. By using the PNP-GaN current spreading layer, the thickness for the optically absorptive ITO current spreading layer can be reduced to decrease internal loss and then enhance the lasing power. Furthermore, we investigate the impact of the doping concentration, the thickness and the position for the inserted n-GaN layer on the lateral hole confinement capability, the lasing power, and the optimization strategy. Our investigations also report that the optimized PNP-GaN structure will suppress the thermal droop of the lasing power for our proposed VCSELs. (C) 2020 Optical Society of America under the terms of the OSA Open Access Publishing Agreement

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