Fast fabrication of silicon nanopillar array using electron beam lithography with two-layer exposure method

Published 2020 View Full Article

  1. Home
  2. Publications
  3. Publication Search
  4. Publication Details
Title
Fast fabrication of silicon nanopillar array using electron beam lithography with two-layer exposure method
Authors
Keywords
Electron beam lithography, Two-layer exposure method, Silicon nanopillar array, Fast fabrication, Thermal reflow
Journal
MICROELECTRONIC ENGINEERING
Volume 227, Issue -, Pages 111311
Publisher
Elsevier BV
Online
2020-04-08
DOI
10.1016/j.mee.2020.111311

Ask authors/readers for more resources

Protocol

Community support

Reagent

Community support

Reprint

Contact the author

Discover Peeref hubs

Discuss science. Find collaborators. Network.

Join a conversation

Add your recorded webinar

Do you already have a recorded webinar? Grow your audience and get more views by easily listing your recording on Peeref.

Upload Now
Webinars Posters Questions Hubs Funding Journals Articles Connect Collections Reviewers About Us FAQs Mobile App Privacy Policy Terms of Use
© Peeref 2019-2024. All rights reserved.