Effects of the inductively coupled Ar plasma etching on the performance of (111) face CdZnTe detector

Published 2020 View Full Article

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Title
Effects of the inductively coupled Ar plasma etching on the performance of (111) face CdZnTe detector
Authors
Keywords
CdZnTe, ICP plasma, Surface treatment
Journal
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
Volume 109, Issue -, Pages 104929
Publisher
Elsevier BV
Online
2020-01-14
DOI
10.1016/j.mssp.2020.104929

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