Aluminum doping for optimization of ultrathin and high-k dielectric layer based on SrTiO3

Published 2019 View Full Article

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Title
Aluminum doping for optimization of ultrathin and high-k dielectric layer based on SrTiO3
Authors
Keywords
Aluminum doping, SrTiO, 3, ultrathin, High dielectric constant, MOS capacitors
Journal
JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY
Volume 42, Issue -, Pages 28-37
Publisher
Elsevier BV
Online
2019-12-15
DOI
10.1016/j.jmst.2019.12.006

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