Microstructure, optical and electrical properties of sputtered HfTiO high-k gate dielectric thin films

Published 2016 View Full Article

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Title
Microstructure, optical and electrical properties of sputtered HfTiO high-k gate dielectric thin films
Authors
Keywords
C. Electrical properties, High-k gate dielectrics, Metal–oxide–semiconductor, Conduction mechanisms, Sputtering
Journal
CERAMICS INTERNATIONAL
Volume 42, Issue 10, Pages 11640-11649
Publisher
Elsevier BV
Online
2016-04-15
DOI
10.1016/j.ceramint.2016.04.067

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