High growth rate chemical vapor deposition of graphene under low pressure by RF plasma assistance

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Title
High growth rate chemical vapor deposition of graphene under low pressure by RF plasma assistance
Authors
Keywords
-
Journal
CARBON
Volume 96, Issue -, Pages 1008-1013
Publisher
Elsevier BV
Online
2015-10-25
DOI
10.1016/j.carbon.2015.10.061

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