Influence of Interfacial Oxides at TCO/Doped Si Thin Film Contacts on the Charge Carrier Transport of Passivating Contacts

Published 2019 View Full Article

  1. Home
  2. Publications
  3. Publication Search
  4. Publication Details
Title
Influence of Interfacial Oxides at TCO/Doped Si Thin Film Contacts on the Charge Carrier Transport of Passivating Contacts
Authors
Keywords
-
Journal
IEEE Journal of Photovoltaics
Volume 10, Issue 2, Pages 343-350
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Online
2019-12-20
DOI
10.1109/jphotov.2019.2957672

Ask authors/readers for more resources

Protocol

Community support

Reagent

Community support

Reprint

Contact the author

Add your recorded webinar

Do you already have a recorded webinar? Grow your audience and get more views by easily listing your recording on Peeref.

Upload Now

Ask a Question. Answer a Question.

Quickly pose questions to the entire community. Debate answers and get clarity on the most important issues facing researchers.

Get Started
Webinars Posters Questions Hubs Funding Journals Articles Connect Collections Reviewers About Us FAQs Mobile App Privacy Policy Terms of Use
© Peeref 2019-2024. All rights reserved.