4.6 Article

UV-NIR femtosecond laser hybrid lithography for efficient printing of complex on-chip waveguides

Journal

OPTICS LETTERS
Volume 45, Issue 7, Pages 1862-1865

Publisher

OPTICAL SOC AMER
DOI: 10.1364/OL.386861

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Funding

  1. National Key Research and Development Program of China [2017YFB1104600]
  2. National Natural Science Foundation of China [61590930, 61805098, 11774333, 61825502]
  3. Anhui Initiative in Quantum Information Technologies [AHY130300]
  4. Chinese Academy of Sciences [XDB24030601]

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We propose UV-IR femtosecond laser hybrid lithography for the efficient printing of complex on-chip waveguides, which offers good performance in terms of processing efficiency and accuracy. With this three-dimensional printing technology, waveguides with complex cross-section shapes, such as owls and kittens, can be easily fabricated with an efficiency increased by 1500% (for 6 mu m x 6 mu m). In addition, a circular cross-section waveguide with an extremely low birefringence and complex 8 x 8 random walk networks were quickly customized, which implies that in the design and preparation of the large-scale optical chips, the proposed maskless method allows for the preparation of highly customized devices. (C) 2020 Optical Society of America

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