Journal
OPTICS LETTERS
Volume 45, Issue 1, Pages 113-116Publisher
OPTICAL SOC AMER
DOI: 10.1364/OL.45.000113
Keywords
-
Categories
Funding
- National Basic Research Program of China (973 Program) [2017YFB1104300]
- National Natural Science Foundation of China [61905087, 61935008, 61590930, 61775078, 61825502]
Ask authors/readers for more resources
The reduction and patterning of graphene oxides (GOs) have broad applications in gene transfection, cell differentiation control, etc. However, two-dimensional (2D) photoreduction technologies (such as UV lithography) fail to realize the three-dimensional (3D) reduction and. patterning of GO, limiting its applications in 3D electronic device interconnection and 3D graphene organ-on-a-chip. Here we developed 3D reduction and patterning of GO by femtosecond laser direct writing (FsLDW) technology. FsLDW has been adopted for 3D structure fabrication and 2D/3D micropatterning of reduced GOs on GO films. We deem that this technology will advance GO in the evolution of future electronics. (C) 2019 Optical Society of America
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available
Share Paper
