Effect of post-deposition annealing on atomic layer deposited SiO2 film for silicon surface passivation

Published 2019 View Full Article

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Title
Effect of post-deposition annealing on atomic layer deposited SiO2 film for silicon surface passivation
Authors
Keywords
-
Journal
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
Volume 106, Issue -, Pages 104777
Publisher
Elsevier BV
Online
2019-10-15
DOI
10.1016/j.mssp.2019.104777

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