4.4 Article

High Absorption Contrast Quantum Confined Stark Effect in Ultra-Thin Ge/SiGe Quantum Well Stacks Grown on Si

Journal

IEEE JOURNAL OF QUANTUM ELECTRONICS
Volume 56, Issue 1, Pages -

Publisher

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/JQE.2019.2949640

Keywords

Germanium; stark effect; silicon photonics; optical interconnects

Funding

  1. imec's Industry-Affiliation Program on Optical I/O

Ask authors/readers for more resources

We report on the performance of the quantum confined Stark effect (QCSE) in ultra-thin (similar to 350 nm) Ge/SiGe quantum well stacks grown on Si. We demonstrate an absorption contrast Delta alpha/alpha of 2.1 at 1 Vpp swing in QCSE stacks grown on ultra-thin (100 nm) strain relaxed GeSi buffer layers on 300 mm Si wafers. Such ultra-thin QCSE stacks will enable future integration of highly efficient QCSE electro-absorption modulators with low optical coupling loss to passive Si waveguides in a sub-micron silicon photonics platform.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.4
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

Article Materials Science, Multidisciplinary

Epitaxial Ge-on-Nothing and Epitaxial Ge on Si-on-Nothing as Virtual Substrates for 3D Device Stacking Technologies

R. Loo, C. Porret, H. Han, A. Srinivasan, E. Vecchio, V Depauw

Summary: Two new templates for strain-relaxed detachable Ge are introduced, based on SiON and GeON platforms. Both templates can be used for novel device applications, with GeON being attractive for optical devices manufacturing.

ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY (2021)

Article Chemistry, Multidisciplinary

Simultaneous Dimensional and Analytical Characterization of Ordered Nanostructures

Philipp Hoenicke, Yves Kayser, Konstantin Nikolaev, Victor Soltwisch, Jeroen E. Scheerder, Claudia Fleischmann, Thomas Siefke, Anna Andrle, Grzegorz Gwalt, Frank Siewert, Jeffrey Davis, Martin Huth, Anabela Veloso, Roger Loo, Dieter Skroblin, Michael Steinert, Andreas Undisz, Markus Rettenmayr, Burkhard Beckhoff

Summary: The complexity of 3D structures used in nanotechnologies today has surpassed the capabilities of existing metrology techniques for process development and control. The grazing exit X-ray fluorescence technique allows for simultaneous characterization of nanostructures with sub-nm discrimination capabilities, without the need for access to large-scale research facilities.

SMALL (2022)

Article Materials Science, Multidisciplinary

B and Ga Co-Doped Si1-xGex for p-Type Source/Drain Contacts

Gianluca Rengo, Clement Porret, Andriy Hikavyy, Erik Rosseel, Mustafa Ayyad, Richard J. H. Morris, Rami Khazaka, Roger Loo, Andre Vantomme

Summary: This work discusses the properties of in situ Ga and B co-doped Si0.55Ge0.45 layers. The study shows that post-epi surface cleans are necessary to obtain accurate Ga profiles, and the morphologies, crystalline quality, and electrical properties of the layers degrade with increasing Ga dose.

ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY (2022)

Article Physics, Applied

Automated calibration of model-driven reconstructions in atom probe tomography

Charles Fletcher, Michael P. Moody, Claudia Fleischmann, Masoud Dialameh, Clement Porret, Brian Geiser, Daniel Haley

Summary: The authors proposed a new reconstruction protocol in atom probe tomography to correct image distortions for multiphase materials. By applying this new algorithm to experimental semiconductor multilayer systems and fin field-effect transistor devices, a significant reduction in multiphase image distortions was demonstrated. The method could also be used for testing and validating new developments in field evaporation theory by quantitatively comparing model predictions with experimental results.

JOURNAL OF PHYSICS D-APPLIED PHYSICS (2022)

Article Engineering, Electrical & Electronic

NPN SiGe Hetero Junction Transistor Latch-Up Memory Selector

Gaspard Hiblot, Taras Ravsher, Roger Loo, Bhuvaneshwari Yengula Venkata Ramana, Yann Canvel, Nathali Franchina Vergel, Andrea Fantini, Shamin Houshmand Sharifi, Nina Bazzazian, Mustafa Ayyad, Alex Merkulov, Gouri Sankar Kar, Sebastien Couet

IEEE ELECTRON DEVICE LETTERS (2023)

Article Engineering, Electrical & Electronic

Scaled FinFETs Connected by Using Both Wafer Sides for Routing via Buried Power Rails

A. Veloso, A. Jourdain, D. Radisic, R. Chen, G. Arutchelvan, B. O'Sullivan, H. Arimura, M. Stucchi, A. De Keersgieter, M. Hosseini, T. Hopf, K. D'have, S. Wang, E. Dupuy, G. Mannaert, K. Vandersmissen, S. Iacovo, P. Marien, S. Choudhury, F. Schleicher, F. Sebaai, Y. Oniki, X. Zhou, A. Gupta, T. Schram, B. Briggs, C. Lorant, E. Rosseel, A. Hikavyy, R. Loo, J. Geypen, D. Batuk, G. T. Martinez, J. P. Soulie, K. Devriendt, B. T. Chan, S. Demuynck, G. Hiblot, G. Van der Plas, J. Ryckaert, G. Beyer, E. Dentoni Litta, E. Beyne, N. Horiguchi

Summary: We present a novel routing scheme for scaled finFETs using buried power rails, which ensures tight variability and matching control. By moving the power delivery network to the backside metal level, we can alleviate routing congestion and significantly reduce IR drop values.

IEEE TRANSACTIONS ON ELECTRON DEVICES (2022)

Article Physics, Applied

Low temperature selective growth of Ga-doped and Ga-B co-doped germanium source/drain for PMOS devices

Clement Porret, Gianluca Rengo, Mustafa Ayyad, Andriy Hikavyy, Erik Rosseel, Robert Langer, Roger Loo

Summary: The characteristics and physical properties of gallium-doped (Ge:Ga) and gallium and boron co-doped germanium (Ge:Ga:B) epilayers grown at low temperature (320 degrees C) by chemical vapor deposition are investigated and compared with boron-doped (Ge:B) germanium. Ge:Ga films with resistivities <0.3 m omega.cm outperform Ge:B films prepared using a similar method. A selective Ge:Ga growth process based on a cyclic deposition and etch routine is developed and applied to fin structures, demonstrating full process selectivity towards nitride and oxide surfaces. However, the reduction in Ga incorporation in the selective growth process leads to a degradation of electrical performance. Ti/Ge:Ga(:B) contacts are evaluated to provide new solutions for advanced Ge-based devices.

JAPANESE JOURNAL OF APPLIED PHYSICS (2023)

Article Energy & Fuels

Wafer-scale Ge epitaxial foils grown at high growth rates and released from porous substrates for triple-junction solar cells

Valerie Depauw, Clement Porret, Myriam Moelants, Emma Vecchio, Koen Kennes, Han Han, Roger Loo, Jinyoun Cho, Guillaume Courtois, Rufi Kurstjens, Kristof Dessein, Victor Orejuela, Clara Sanchez-Perez, Ignacio Rey-Stolle, Ivan Garcia

Summary: The study focuses on upscaling the Ge lift-off concept by fabricating large-sized Ge foils as III-V epitaxy seed and support substrates, proving that porous germanium is a more sustainable alternative for multijunction solar cell processes.

PROGRESS IN PHOTOVOLTAICS (2022)

Proceedings Paper Engineering, Multidisciplinary

Small target compatible dimensional and analytical metrology for semiconductor nanostructures using X-ray fluorescence techniques

Philipp Hoenicke, Yves Kayser, Victor Soltwisch, Andre Waehlish, Nils Wauschkuhn, Jeroen E. Scheerder, Claudia Fleischmann, Janusz Bogdanowicz, Anne-Laure Charley, Anabela Veloso, Roger Loo, Hans Mertens, Andriy Hikavyy, Thomas Siefke, Anna Andrle, Grzegorz Gwalt, Frank Siewert, Richard Ciesielski, Burkhard Beckhoff

Summary: X-ray fluorescence techniques in special operation modes can provide valuable quantitative insights for semiconductor related applications and can be made compatible to typical sizes of homogeneously structured metrology pads. By using small excitation beams, it can be ensured that no adjacent regions are irradiated or that no X-ray fluorescence radiation from adjacent areas reaches the detector, allowing for a multitude of information retrieval from XRF data. In addition to elemental composition and sensitivity to sub-surface features, quantitative amounts of material and even dimensional properties of the nanostructures under study can be derived.

METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVII (2023)

Proceedings Paper Engineering, Electrical & Electronic

Low temperature source/drain epitaxy and functional silicides: essentials for ultimate contact scaling

C. Porret, J. L. Everaert, M. Schaekers, L. A. Ragnarsson, A. Hikavyy, E. Rosseel, G. Rengo, R. Loo, R. Khazaka, M. Givens, X. Piao, S. Mertens, N. Heylen, H. Mertens, C. Toledo de Carvalho Cavalcante, G. Sterckx, S. Brus, A. Nalin Mehta, M. Korytov, D. Batuk, P. Favia, R. Langer, G. Pourtois, J. Swerts, E. Dentoni Litta, N. Horiguchi

Summary: Low temperature Si1-xGex source-drain epitaxy processes can alleviate access resistance issues in modern logic devices by utilizing specific stack structures. Among the different systems investigated, TiN / W metal-to-metal interfaces demonstrate low contact resistivity, while Sc / Si:P stacks exhibit improved performance. Analysis of the Sc / Si:P stacks reveals the material properties and reaction mechanisms responsible for the reduction in contact resistivity.

2022 INTERNATIONAL ELECTRON DEVICES MEETING, IEDM (2022)

Proceedings Paper Engineering, Electrical & Electronic

60Gb/s waveguide-coupled O-band GeSi quantum-confined Stark effect electro-absorption modulator

S. A. Srinivasan, C. Porret, S. Balakrishnan, Y. Ban, R. Loo, P. Verheyen, J. Van Campenhout, M. Pantouvaki

Summary: This study presents an O-band GeSi quantum-confined Stark effect waveguide-coupled electro-absorption modulator with a bandwidth of 50GHz, demonstrating a static extinction ratio of 5.2dB, insertion loss of 7.6dB, and operation at 60Gb/s NRZ-OOK for a 2V swing.

2021 OPTICAL FIBER COMMUNICATIONS CONFERENCE AND EXPOSITION (OFC) (2021)

Proceedings Paper Energy & Fuels

GaInP solar cells grown on Ge-on-Ge engineered substrates

Rufi Kurstjens, Guillaume Courtois, Jinyoun Cho, Kristof Dessein, Ivan Garcia, Ignacio Rey-Stolle, Carlos Algora, Valerie Depauw, Clement Porret, Roger Loo

Summary: The Umicore Ge-on-Ge engineered substrate concept involves a thin epi-ready germanium foil weakly attached to a bulk germanium mother substrate, allowing for easy detachment and multiple re-uses. III-V layers were successfully grown and characterized on these substrates, along with the fabrication and characterization of GaInP single junction devices. The similar performance of Ge-on-Ge as an epi-template to bulk Ge was demonstrated by the unaffected V-oc of the solar cells.

2021 IEEE 48TH PHOTOVOLTAIC SPECIALISTS CONFERENCE (PVSC) (2021)

No Data Available