Effect of Al2O3 deposition on carrier mobility and ambient stability of few-layer MoS2 field effect transistors

Published 2019 View Full Article

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Title
Effect of Al2O3 deposition on carrier mobility and ambient stability of few-layer MoS2 field effect transistors
Authors
Keywords
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Journal
CURRENT APPLIED PHYSICS
Volume 20, Issue 2, Pages 363-365
Publisher
Elsevier BV
Online
2019-12-19
DOI
10.1016/j.cap.2019.12.002

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